Contrast Masking Photography Workshops
Established
2005
Program Description
Darkroom workshops for traditional B&W photographers that are devoted to contrast masking & other printing techniques
Programs/Year
3 basic, 1 advanced
Program Length
3 days
Group Size or S:T Ratio
4:1
Program Focus
Artistic Technique
Faculty
Fine art photographer & author Lynn Radeka (Contrast Masking Kit and other publications)with over 40 years experience in fine-art photography.
Costs
$600 for basic workshop, $600 for advanced workshop.
U.S. Locations
Placentia, California
Months
February, April, June, August, October
Contact
Lynn Radeka
Photographer
Contrast Masking Photography Workshops
1249 Brian St.
Placentia, CA 92870
United States
E-Mail:
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